Logo LastStep white, European Project

LastStep Consortium

An alliance of 10 organizations

An European Collaboration

The partners are leaders of CMOS-compatible technologies for growth and processing of GeSn direct bandgap alloys in industrially relevant environment. Together with two SMEs well established in the markets of gas and liquid sensing and a world leading PIC design and test-house company, we develop gas and liquid sensor prototypes based on the fully-group-IV photonic platform.

Consorsium LastStep : european project

Discover the means and tools made available to the LastStep Project

5 countries

A Cutting-Edge Collaboration

Two research units of the CEA joined their forces in the LastStep project. CEA-LETI (Laboratory for Electronics and Information Technology) belongs to CEA Tech. CEA-LETI benefits from 8000 m2 clean rooms. It is currently employing 1900 people, among whom 250 Ph.D. students and post-Ph.Ds. The laboratory is structured into six departments, with a specific department operating 24/7 the technological facilities of the silicon technology platform, and five program-oriented departments covering the fields of Microelectronics, Microsystems, Optics and photonics, System design, and Technologies for bio and health. The CEA-IRIG (Institute for Nanosciences and Cryogenics, former DRFMC) is also located at Grenoble and belongs to the CEA Fundamental Research Division (DRF). The SINAPS laboratory @ IRIG/DEPHY/PHELIQS, investigates the new physical phenomena appearing when group IV semiconductors are down-sized to the nanometer scale.

Juelich is a world leading research group in the field of Si-based electronic and optoelectronic materials and devices and pioneer in material growth and optical characterization of GeSn and SiGeSn alloys. Together with partners PSI, UnivLeeds and LETI, JUELICH has proven the fundamental direct bandgap of GeSn alloys and demonstrated the optically pumped GeSn laser. JUELICH combines a broad knowledge base in fundamental and device physics, semiconductor technology and material science.

UPSaclay host the largest French academic technological platform with about 2800 m2 of clean room. This clean room is fully equipped to provide technological support to LastStep, that include nanophotonics, nanoelectronics, material growth, microsystems and bio applications. The laboratory is as well fully equipped to perform electro-optical spectroscopy of bulk and integrated photonic systems. UPSaclay has advanced material characterization tools like FEI-STEM. The laboratory has as well the full resources to perform electro-optical characterizations of the devices fabricated within LastStep.

School of Electronic and Electrical Engineering of the University of Leeds, UK, has over 20 years long tradition in theoretical and computational modelling of semiconductor nanostructures and devices based upon them, including SiGe and (Si)GeSn materials and devices, and more recently has also been successful in MBE growth and processing of III-V based nanostructures and devices, primarily quantum cascade lasers in the THz range, and their sensing/imaging applications. In the last decade the School has been very strongly involved in UK silicon photonics projects, with a significant experience in modelling accumulated in this area.

eLichens is a French innovative startup in the field of Air Quality monitoring, being one of the major challenges of the next decade. Created in December 2014, eLichens’ mission is to help individuals digitize their environment. The company relies on a portfolio of patents (30 patents in total either owned or co-owned by eLichens), know-how and skills, which enable it to develop and market.

Laststep: European collaboration in photonics
Where does the funding come from?

European funding

The LastStep project has received funding from the European Union’s Horizon 2020 research and innovation program under the grant agreement no. 101070208.

The high quality work of the group was recognized by different prizes at International Conference as well as many invited talk.

Juelich benefits from the Helmholtz Nano Facility (HNF) a state-of -the art 1000 m2 clean-room  including dedicated 200 mm and 300 mm wafers epitaxy and processing. The HNF works according to the norms VDI DIN 2083 and DIN EN ISO 14644.

Laststep: European collaboration in photonics
LastStep : European Collaboration
Laststep : photonic european projet
Join Us

Our latest job offers

A position is offered at C2N to work on the development and analysis of electro-optical structure based on GeSn alloys for IR laser devices
A three-year position is offered at CEA to work on mid-infrared sources and detectors for GeSn photonic circuits integrated on silicon for environmental detection.