Innovative Annealing Technology for Thermally Stable Ni(GeSn) Alloys

Participation at the 21st International Workshop on Junction Technology (IWJT), Kyoto, Japan

 

Investigation of the use of UV-nanosecond laser annealing (UV-NLA) to obtain more stable Ni(GeSn) alloys than with conventional rapid thermal annealing
(RTA).

Sheet resistance evolution with the Energy Densisty for Ni / Ge0.9Sn0.1 samples annealed by UV-NLA with a single laser pulse.
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