Publication on Innovative Annealing Technology for Thermally Stable Ni(GeSn) Alloys

Quintero A., Alba P.A., Hartmann J.-M., Gergaud P., Reboud V., Rodriguez P., Innovative Annealing Technology for Thermally Stable Ni(GeSn) Alloys, (2023) 2023 21st International Workshop on Junction Technology, IWJT 2023, DOI: 10.23919/IWJT59028.2023.10175097

UV-nanosecond laser annealing (UV-NLA) was shown to effectively form thermally stable Ni(GeSn) alloys, outperforming conventional RTA by preventing Sn segregation.

The phase formation followed a similar sequence to RTA, with Ni₅(GeSn)₃ forming at low energy densities, followed by mono-stanogermanide Ni(GeSn) at higher energies.

Surface morphology and sheet resistance were influenced by wrinkle formation at high energy densities, due to stress relaxation of the TiN capping layer when the underlying GeSn melted.

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